武汉大学物理科学与技术学院博士生导师简介:刘昌

2016-10-12 17:04:02来源:网络

  学术报告(conference presentation):

  1.Influence of substrate temperature on damage and doping of ion implanted GaN, 11th Ion Beam Modification of Materials (IBMM 1998), Amsterdam, Netherland, Sept 1-5, 1998, invited talk (大会报告)

  2.Structural characterization of ion implanted GaN, Department of Physics, University of Leipzig, invited talk, Dec. 18, 1999.

  3.Amorphization of GaN by ion implantation, E-MRS 2000, Symp. R, oral presentation 2000.

  4.Preparation and characterization of indium tin oxide film grown at room temperature, Japan 4th Symposium on Beam Science and Technology for an Emergent Network (BESTEN 2002), invited talk, Osaka, Japan 2002.

  5.Characterization of indium tin oxide films prepared by oxygen ion beam assisted deposition, 1st Asian Symposium on Ion and Plasma Surface Finishing, oral presentation, 2002。

  6.Preparation and characterization of TiO2 and TiO2:SiO2 nanocrystalline powders and thin films, 11th Sino-Korea Joint Symp. on Thin Films, June 28-July 5, 2004, Chengdu, China.

  7.Preparation and characterization of nanocrystalline titanium and zinc oxides, Oct.14, 2004, Leibniz Institute for Surface Modification, Leipzig, Germany

  8.Ion implantation into GaN: damage, annealing and lattice site location, 1st China-Korea Joint Symp. on Wide-Bandgap Semiconductors & Spintronics, May 11-15, 2005, Wuhan University, China.

  9.Amorphization and lattice location of ion implanted GaN,Singapore-Sino Joint Symp. on Research Frontiers in Physics, Aug. 28-30, 2005, National University of Singapore.

  10.Preparation, characterization and application of nanooxides, 4th Inter. Conf. on Adv. Mater. & Dev. (ICAMD), Jeju, Korea, Dec 5-7, 2005, invited talk.

  11.Ion implantation into GaN, SVT Associates, MN, USA, Feb. 7, 2006, invited talk.

  12.Lattice location of dopants in GaN, 1st Korea-China Symp. on Advanced Functional Films for Information, Jeju, Korea, Sept. 20-24, 2006, invited talk.

  13.Growth and Ion implantation into GaN material and device, Hanyang University, Seoul, Korea, Sept. 25, 2006. invited talk.

  14.刘昌,范湘军,离子注入GaN, 2006年全国荷电粒子源、粒子束学术会议,武汉,2006年10月14-19日,大会邀请报告。

  15.梅菲,彭挺,刘昌,分子束外延生长AlGaN/GaN高电子迁移率晶体管,2006年全国真空年会,2006年10月21-24日,西安,电子材料与器件分会报告。

  16.刘昌,第三带宽禁带半导体材料和器件,全国集成电路工艺计算机辅助设计系统研讨会,2006年11月28-30日,湖北大学,邀请报告。

  17.Reduction of Threading Dislocations in AlN Epilayers by Interlayer Interruption, 2nd China-Korea Symp. on Advanced Functional Films for Information, Jinan, China, July 7-10, 2007, invited talk.

  18.Simulation of voltage-controlled variable light emissions from GaN codoped with Eu, Er, and Tm, 2nd China-Korea Symp. on Advanced Functional Films for Information, Jinan, China, July 7-10, 2007.

  19.Fabrication of ZnO/GaN heterostructure on GaN substrate by e-beam evaporation, 2nd China-Korea Symp. on Advanced Functional Films for Information, Jinan, China, July 7-10, 2007.

  20.MBE growth of AlN thin films and AlGaN/GaN heterostructures,3rd China-Korea Joint Symp. on Wide-Bandgap Semiconductors & Spintronics, Jeju, Korea, Aug. 26-29, 2007, invited talk.

  21.离子注入GaN及其在器件中的应用,2007年中国物理年会半导体物理分会邀请报告,2007年9月18-20日,南京大学。

  22.Effect of AlN/GaN superlattices on Al0.45Ga0.55N epitaxial layer grown on AlN/sapphire templates by molecular beam epitaxy,Q. M. Fu, T. Peng, Y. Pan, K. M. Wu, and C. Liu, 3rd China-Korea Symp. on Advanced Functional Films for Information, Inha University, Incheon, Korea, Sept. 28 – Oct. 2, 2008. invited talk.

  23.Growth of AlGaN/GaN hetero-structures on transition metal doped GaN templates,Photonics and OptoElectronics Meetings (POEM2009) ("Solar Cells, Solid State Lighting and Information Display Technologies (SSID)"), Wuhan, P.R. China,August 8-10 2009, invited talk.

  24.Preparation of Semi-Insulating GaN Templates for AlGaN/GaN Heterostructures, 1st International Symposium on Photonics and Optoelectronics (SOPO 2009), Wuhan, China, Aug.14-16, Plenary Speech.

  25.Investigation on the fabrication and transport properties of YMnO3/GaN, 4th China-Korea Symp. on Advanced Functional Films for Information, Lanzhou, China, Aug.16-21, 2009.

  26.YMnO3在GaN上的集成生长与漏电性能研究,2009年中国物理年会半导体物理分会邀请报告,2009年9月18-20日,上海交通大学。

  27.Cu2O/GaN heterostructures, 2nd International Symposium on Photonics and Optoelectronics (SOPO 2010), Chengdu, China, Jun.19-21. Oral presentation.

  28.Structural, electrical, optical and room-temperature ferromagnetic properties of Cu2O/GaN hetero-structures,5th China-Korea Symp. on Advanced Functional Films for Information, Ulsan University, Ulsan, Korea, Aug. 17-21, 2010. invited talk.

  29.氮化物高电子迁移率晶体管,中青年科学家威海论坛2011主题:先进材料与核科学技术, 2011年7月27-8月2日,山东威海,邀请报告。

  30.绝缘GaN衬底制备及HEMT与铁电集成,第九届全国分子束外延学术会议, 2011年7月4-8日,哈尔滨,大会邀请报告。

  31.武汉大学拔尖人才培养的几点尝试,2011年全国大学物理教学研讨会,2011年10月28-30日,山东济南,大会邀请报告。

  32.ALD growth of the non-polar ZnO thin films,第一届国际ALD应用大会暨第二届中国ALD学术交流会,2012年10月15-16日,上海复旦大学,口头报告。

  33.Growth and optical properties of ZnO/AlN/GaN p-I-n junctions,第一届国际ALD应用大会暨第二届中国ALD学术交流会,2012年10月15-16日,上海复旦大学,口头报告。

  34.ZnO/Si and ZnO/GaN heterojunctions: structural, electrical and optical properties, 1st China-Korea Symposium on Low Dimensional Electronic and Photonic Materials and Devices, Guilin, China, Nov. 5-9. 2012,invited talk.

  35.Nonpolar Plane ZnO Films deposited by Atomic Layer Deposition,2012 Collaborative Conference on Crystal Growth (3CG), Hilton Orlando at SeaWorld, Orlando Florida, USA, Dec. 11-14, 2012, invited talk.

  36.Study on ZnO-based heterojunctions: structural, electrical and optical properties, The WCU Korea-China Workshop on Nitride Semiconductors 2013, Seoul National University, Seoul, Korea, July 20 ~ 23, 2013. invited talk.

  37.ZnO-based heterojunctions: structural, electrical and optical properties,The 8th Pacific Rim International Congress on Advanced Materials and Processing (PRICM8),Hawaii, Aug. 4-9, 2013, oral presentation.

  38.原子层沉积法制备极性、半极性和非极性面ZnO异质结器件,湖北省物理学会2013年年会,2013年8月20-24日,邀请报告。

  39.Near-infrared random lasing from m-plane ZnO, 2nd China-Korea Symposium on Low Dimensional Electronic and Photonic Materials and Devices, Busan, Korea, Aug. 26-30, invited talk.

  40.Growth of polar, semipolar and nonpolar ZnO thin films by atomic layer deposition andstudy on shape-dependent localized surface Plasmon enhanced UV-emission,11th International Conference on Nano Science and Nano Technology (ICNST 2013), Chosun University, Gwangju, Korea,Nov. 7-8, 2013, invited talk.

  专利:

  1. Kiuchi, C. Liu, and T. Matsutani, Preparation of Transparent Conducting Films, Japanese Patent No.: 2002-180762

  2. 刘昌,梅菲,一种GaN绝缘或半绝缘外延层的制备方法,专利批准号:ZL200710052167.2,授权公告日:2009年2月25日

  3. 刘昌,张蕾,梅菲,刘福庆,一种电致发光二极管的制备方法,ZL200710052646.4,授权公告日:2009年5月14日

  4. 刘昌,付秋民,刘博,一种高质量AlN薄膜的制备方法,专利批准号:ZL200810048681.3授权公告日:2011年8月17日

  5. 刘昌,王倜,吴昊,陈超,一种在硅衬底上生长m面ZnO的方法,ZL201210006637.2,授权公告日:2014年2月18日


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